The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 13, 2005
Filed:
Jun. 07, 2002
Kevin J. Moeggenborg, Naperville, IL (US);
Homer Chou, Hoffman Estates, IL (US);
Joseph D. Hawkins, Aurora, IL (US);
Jeffrey P. Chamberlain, Aurora, IL (US);
Kevin J. Moeggenborg, Naperville, IL (US);
Homer Chou, Hoffman Estates, IL (US);
Joseph D. Hawkins, Aurora, IL (US);
Jeffrey P. Chamberlain, Aurora, IL (US);
Cabot Microelectronics Corporation, Aurora, IL (US);
Abstract
The invention provides a method of polishing a substrate containing a low-k dielectric layer comprising (i) contacting the substrate with a chemical-mechanical polishing system comprising (a) an abrasive, a polishing pad, or a combination thereof, (b) an amphiphilic nonionic surfactant, and (c) a liquid carrier, and (ii) abrading at least a portion of the substrate to polish the substrate.