Company Filing History:

8 out of 716

Nuflare Technology, Inc.

patents

1 out of 2,528

Hoya Corporation

patents

where one patent can have more than one assignee

Years Active: 2009-2014

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8 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 8653487 - Lithography apparatus and lithography method (2014-02-18),

2. 8367276 - Mask blank and method of manufacturing mask (2013-02-05),

3. 8188443 - Focusing method of charged particle beam and astigmatism adjusting method of charged particle (2012-05-29),

4. 7977654 - Writing apparatus and writing method (2011-07-12),

5. 7923704 - Charged particle beam writing method (2011-04-12),

6. 7679068 - Method of calculating deflection aberration correcting voltage and charged particle beam writing method (2010-03-16),

7. 7652271 - Charged-particle beam lithography with grid matching for correction of beam shot position deviation (2010-01-26),

8. 7485879 - Electron beam writing apparatus and writing method (2009-02-03),

Title: Hitoshi Sunaoshi: Innovator in Lithography Technology

Introduction

Hitoshi Sunaoshi is a prominent inventor based in Kanagawa, Japan. He has made significant contributions to the field of lithography, holding a total of 8 patents. His work has been instrumental in advancing technologies that are crucial for various applications in the semiconductor industry.

Latest Patents

Among his latest patents, Sunaoshi has developed a lithography apparatus and method. This apparatus includes a generating unit that creates pattern writing data based on character information specifying the shape of an identification figure. Additionally, it features a synthesizing unit that combines this data with existing pattern writing data to produce a comprehensive output. Another notable patent involves a mask blank and a method for manufacturing it. This mask blank is designed on a transparent substrate with a light-shielding film primarily made of chromium. It is utilized to create photomasks through lithography using electron beam writing resist.

Career Highlights

Sunaoshi has worked with notable companies such as Nuflare Technology, Inc. and Hoya Corporation. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking innovations in lithography technology.

Collaborations

Some of his coworkers include Takashi Kamikubo and Shuichi Tamamushi. Their collaborative efforts have further enhanced the advancements in the technologies they have worked on together.

Conclusion

Hitoshi Sunaoshi's contributions to lithography technology are significant and impactful. His innovative patents and career achievements reflect his dedication to advancing the field.

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