The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 29, 2012
Filed:
Mar. 06, 2008
Kenji Ohtoshi, Kanagawa, JP;
Hitoshi Sunaoshi, Kanagawa, JP;
Osamu Iizuka, Kanagawa, JP;
Takahito Nakayama, Shizuoka, JP;
Kenji Ohtoshi, Kanagawa, JP;
Hitoshi Sunaoshi, Kanagawa, JP;
Osamu Iizuka, Kanagawa, JP;
Takahito Nakayama, Shizuoka, JP;
NuFlare Technology, Inc., Numazu-shi, JP;
Abstract
A focusing method of a charged particle beam includes measuring a first set value to focus a beam on a position of a reference plane by using a lens coil, acquiring a first factor to change a set value of an electrostatic lens depending on a distance and a second factor to change a set value of the coil depending on a distance, measuring a level distribution of a target plane, correcting the first set value by using the second factor to correct a focal point position of the beam in the coil from the position of the reference plane to an intermediate level position of the level distribution of the target plane, and correcting a second set value of the lens depending on a level position of the target plane by using the first factor to correct a focal point position of the beam by the lens.