The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 16, 2010
Filed:
Dec. 28, 2006
Takashi Kamikubo, Kanagawa, JP;
Shuichi Tamamushi, Kanagawa, JP;
Hitoshi Sunaoshi, Kanagawa, JP;
Kenji Ohtoshi, Kanagawa, JP;
Rieko Nishimura, Kanagawa, JP;
Takashi Kamikubo, Kanagawa, JP;
Shuichi Tamamushi, Kanagawa, JP;
Hitoshi Sunaoshi, Kanagawa, JP;
Kenji Ohtoshi, Kanagawa, JP;
Rieko Nishimura, Kanagawa, JP;
NuFlare Technology, Inc., Numazu-shi, JP;
Abstract
A method of obtaining a deflection aberration correcting voltage. The method includes writing predetermined patterns at a plurality of focus height positions such that a dose is used as a variable. Dimensional variations of width sizes of the predetermined patterns written at the plurality of focus height positions such that the dose is used as the variable are measured. Further, effective resolutions of the written predetermined patterns are calculated by using the dimensional variations. The method further includes, on the basis of a focus height position at which a minimum effective resolution of the predetermined patterns is obtained, calculating a correcting voltage to correct deflection aberration and outputting the correcting voltage. The correcting voltage is used when a charged particle beam is deflected.