Location History:
- Izumi, JP (1988 - 1989)
- Sendai, JP (1992 - 1998)
- Miyagi-ken, JP (1997 - 2008)
Company Filing History:
Years Active: 1988-2008
Title: Hitoshi Seki: Innovator in Electronic Device Manufacturing
Introduction
Hitoshi Seki is a prominent inventor based in Sendai, Japan. He has made significant contributions to the field of electronic device manufacturing, holding a total of nine patents. His work focuses on developing innovative etching agents and methods that enhance the manufacturing process of electronic devices.
Latest Patents
One of Hitoshi Seki's latest patents involves an etching reagent and a method for manufacturing electronic device substrates and electronic devices. This invention provides an etching agent capable of etching a copper film using a simple chemical etching method, such as an immersion method. The etching agent comprises an aqueous solution containing potassium hydrogen peroxosulfate and hydrofluoric acid. This formulation allows for minimal time-dependent changes in the etching rate and prevents pattern narrowing due to irregular side etching of the copper film. The process includes forming masks of a given pattern on a laminated film created by sequentially depositing a titanium or titanium alloy film and a copper film on a substrate. The etching agent is then used to create gate electrodes and lower pad layers with specified patterns.
Career Highlights
Hitoshi Seki has worked with notable companies in the industry, including Alps Electric Co., Ltd. and Frontec Incorporated. His experience in these organizations has contributed to his expertise in electronic device manufacturing and innovation.
Collaborations
Throughout his career, Hitoshi Seki has collaborated with talented individuals such as Yasuhiko Kasama and Chisato Iwasaki. These collaborations have likely enriched his work and led to further advancements in his field.
Conclusion
Hitoshi Seki is a distinguished inventor whose contributions to electronic device manufacturing have been significant. His innovative patents and collaborations reflect his commitment to advancing technology in this area.