The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 28, 1997
Filed:
Jul. 07, 1995
Applicant:
Inventors:
Hitoshi Seki, Miyagi-ken, JP;
Chisato Iwasaki, Miyagi-ken, JP;
Akane Sekiya, Miyagi-ken, JP;
Yasuhiko Kasama, Miyagi-ken, JP;
Tadahiro Ohmi, Tokyo, JP;
Assignees:
Frontec Incorporated, Sendai, JP;
Other;
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G03C / ;
U.S. Cl.
CPC ...
216 94 ; 216 83 ; 252 792 ; 252 791 ; 134-1 ;
Abstract
The present invention provides a method of removing a photoresist film, which exhibits the high ability to remove photoresist and excellent safety and handling properties such as workability, In the removing method, the photoresist film is removed by chemical decomposition in an inorganic aqueous solution under ultraviolet-light irradiation. The inorganic aqueous solution is an aqueous solution of peroxomonosulfate or an aqueous solution containing 4.5 to 36 wt % of sulfuric acid and 0.05 to 0.8 wt % of hydrogen peroxide.