Company Filing History:
1 out of 37 
1 out of 832,761 Years Active: 1997
Title: Akane Sekiya: Innovator in Photoresist Film Removal
Introduction
Akane Sekiya is a notable inventor based in Miyagi-ken, Japan. She has made significant contributions to the field of materials science, particularly in the area of photoresist film removal. Her innovative methods have garnered attention for their effectiveness and safety.
Latest Patents
Akane Sekiya holds a patent for a method of removing photoresist film. This invention provides a high ability to remove photoresist while ensuring excellent safety and handling properties. The method involves chemical decomposition in an inorganic aqueous solution under ultraviolet-light irradiation. The solution can be an aqueous solution of peroxomonosulfate or a mixture containing 4.5 to 36 wt % of sulfuric acid and 0.05 to 0.8 wt % of hydrogen peroxide.
Career Highlights
Throughout her career, Akane has worked with various companies, including Frontec Incorporated. Her work has been instrumental in advancing techniques related to photoresist film applications.
Collaborations
Some of her notable coworkers include Hitoshi Seki and Chisato Iwasaki, who have contributed to her research and development efforts.
Conclusion
Akane Sekiya's innovative approach to photoresist film removal showcases her expertise and commitment to safety in chemical processes. Her contributions continue to influence the field positively.