Location History:
- Fukushima, JP (2010)
- Nishishirakawa, JP (2012 - 2016)
- Shirakawa, JP (2019 - 2021)
Company Filing History:
Years Active: 2010-2021
Title: Hisayuki Saito: Innovator in Crystal Defect Evaluation
Introduction
Hisayuki Saito is a prominent inventor based in Shirakawa, Japan. He has made significant contributions to the field of semiconductor technology, particularly in the evaluation of crystal defects in silicon wafers. With a total of 6 patents to his name, Saito's work has advanced the understanding and assessment of material properties critical to the electronics industry.
Latest Patents
Saito's latest patents include a method for evaluating crystal defects and a method for evaluating warpage of wafers. The method for evaluating crystal defects allows for the assessment of defect distribution in silicon wafers by forming an oxide film of a specific thickness. This innovative approach enables the measurement of GOI characteristics, leading to the identification of crystal defects as small as 10 nm. Additionally, his method for evaluating wafer warpage involves measuring the warpage of a wafer in a free state, allowing for precise calculations of warpage differences at specific points on the wafer.
Career Highlights
Saito is currently employed at Shin-Etsu Handotai Co., Ltd., a leading company in the semiconductor industry. His work has been instrumental in enhancing the quality and reliability of silicon wafers used in various electronic applications. His expertise in evaluating crystal defects and wafer warpage has positioned him as a key figure in semiconductor research and development.
Collaborations
Saito has collaborated with notable colleagues, including Izumi Fusegawa and Ryoji Hoshi. These partnerships have fostered innovation and have contributed to the advancement of semiconductor technologies.
Conclusion
Hisayuki Saito's contributions to the field of semiconductor technology through his innovative patents and collaborations highlight his importance as an inventor. His work continues to influence the industry, paving the way for future advancements in material evaluation and semiconductor manufacturing.