Joetsu, Japan

Hisatoshi Otsuka


 

Average Co-Inventor Count = 2.6

ph-index = 5

Forward Citations = 95(Granted Patents)


Location History:

  • Naka Kubiki-gun, JP (2001 - 2006)
  • Kubiki-mura, JP (2002 - 2007)
  • Niigata-ken, JP (2004 - 2014)
  • Joetsu-shi, JP (2016)
  • Joetsu, JP (2010 - 2018)

Company Filing History:


Years Active: 2001-2018

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29 patents (USPTO):Explore Patents

Title: Hisatoshi Otsuka: Pioneering Innovations in Quartz Glass Technology

Introduction

Hisatoshi Otsuka, an accomplished inventor based in Joetsu, Japan, holds an impressive portfolio featuring 29 patents. His work focuses primarily on innovations in quartz glass technology, contributing significantly to advancements in the field, particularly for applications in extreme ultraviolet (EUV) lithography.

Latest Patents

Among Hisatoshi Otsuka's latest patents are groundbreaking methods involving titania-doped quartz glass. One notable patent describes a specific method for creating a EUV light-reflecting surface of titania-doped quartz glass. This method establishes that the angle (θ) between a line connecting an origin (O) at the center of the reflecting surface and a birefringence measurement point (A) should average more than 45 degrees. By ensuring fast axes of birefringence are distributed concentrically, Otsuka's innovation enables the production of high flatness substrates ideal for EUV lithography applications. Additionally, he has developed methods for selecting titania-doped quartz glass that reduces OH group concentration to no more than 100 ppm after heat treatment at 900°C for 100 hours, enhancing its suitability for EUV lithography components.

Career Highlights

Hisatoshi Otsuka has made significant contributions through his tenure at prominent companies such as Shin-Etsu Chemical Co., Ltd. His work there laid the groundwork for various innovations in materials and processes that have improved the functionality and efficiency of optical devices, particularly in semiconductor manufacturing.

Collaborations

Throughout his career, Otsuka has collaborated with esteemed colleagues including Shigeru Maida and Kazuo Shirota. These partnerships have fostered a collaborative spirit within the research community, pushing the boundaries of quartz glass applications in innovative fields.

Conclusion

Hisatoshi Otsuka's work exemplifies the cutting-edge advancements in quartz glass technology that are vital to the future of EUV lithography. With a robust record of patent holdings and collaborations, Otsuka continues to be a pivotal figure in material innovations, driving both industry standards and technological progress. Through his inventions, he has significantly contributed to enhancing performance in semiconductor technologies, proving the importance of continuous innovation in this highly competitive field.

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