The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 29, 2017
Filed:
Jun. 18, 2013
Applicant:
Shin-etsu Chemical Co., Ltd., Tokyo, JP;
Inventors:
Shigeru Maida, Joetsu, JP;
Hisatoshi Otsuka, Joetsu, JP;
Tetsuji Ueda, Koriyama, JP;
Masanobu Ezaki, Koriyama, JP;
Assignee:
Shin-Etsu Chemical Co., Ltd., Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
C03B 19/14 (2006.01); G03F 7/20 (2006.01); B82Y 10/00 (2011.01); B82Y 40/00 (2011.01); C03C 3/06 (2006.01); G03F 1/24 (2012.01);
U.S. Cl.
CPC ...
G03F 7/2008 (2013.01); B82Y 10/00 (2013.01); B82Y 40/00 (2013.01); C03B 19/1423 (2013.01); C03B 19/1453 (2013.01); C03C 3/06 (2013.01); G03F 1/24 (2013.01); C03B 2201/21 (2013.01); C03B 2201/23 (2013.01); C03B 2201/42 (2013.01); C03B 2207/06 (2013.01); C03B 2207/12 (2013.01); C03B 2207/36 (2013.01); C03C 2201/06 (2013.01);
Abstract
Methods for selecting titania-doped quartz glass which experiences a reduction in OH group concentration of less than or equal to 100 ppm upon heat treatment at 900° C. for 100 hours as suitable material for the EUV lithography member.