The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 16, 2015
Filed:
Jul. 01, 2013
Applicant:
Shin-etsu Chemical Co., Ltd., Tokyo, JP;
Inventors:
Shigeru Maida, Joetsu, JP;
Hisatoshi Otsuka, Joetsu, JP;
Assignee:
SHIN-ETSU CHEMICAL CO., LTD., Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
C03C 3/06 (2006.01); C03C 3/04 (2006.01); B29C 33/38 (2006.01); C03B 20/00 (2006.01); C03B 19/14 (2006.01);
U.S. Cl.
CPC ...
C03C 3/04 (2013.01); B29C 33/38 (2013.01); C03B 20/00 (2013.01); C03C 3/06 (2013.01); C03B 19/1453 (2013.01); C03B 2201/07 (2013.01); C03B 2201/21 (2013.01); C03B 2201/23 (2013.01); C03C 2201/23 (2013.01);
Abstract
Synthetic quartz glass is prepared by subjecting a silicon-providing feedstock to flame hydrolysis in oxyhydrogen flame, depositing silica fine particles on a rotating quartz glass target while concurrently melting and vitrifying them, thereby forming a synthetic quartz glass ingot, shaping, annealing, and effecting dehydrogenation treatment at a temperature of at least 600° C. and a pressure of up to 5 Pa for a holding time of at least 12 hours. The synthetic quartz glass has a high helium gas permeability and is suited for forming nanoimprint molds.