The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 08, 2016
Filed:
Jan. 02, 2014
Applicant:
Shin-etsu Chemical Co., Ltd., Tokyo, JP;
Inventors:
Shigeru Maida, Joetsu, JP;
Hisatoshi Otsuka, Joetsu, JP;
Tetsuji Ueda, Sasebo, JP;
Masanobu Ezaki, Koriyama, JP;
Assignee:
SHIN-ETSU CHEMICAL CO., LTD., Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
C03C 3/06 (2006.01); C03C 10/00 (2006.01); C03C 4/00 (2006.01); C03B 19/14 (2006.01); C03B 20/00 (2006.01); C03B 25/02 (2006.01); G03F 7/20 (2006.01); G03F 1/60 (2012.01); G03F 1/22 (2012.01);
U.S. Cl.
CPC ...
C03C 10/00 (2013.01); C03B 19/1453 (2013.01); C03B 19/1469 (2013.01); C03B 20/00 (2013.01); C03B 25/02 (2013.01); C03C 3/06 (2013.01); C03C 4/0085 (2013.01); G03F 1/60 (2013.01); G03F 7/70958 (2013.01); C03B 2201/42 (2013.01); C03B 2207/20 (2013.01); C03C 2201/42 (2013.01); G03F 1/22 (2013.01);
Abstract
A member is made of titania-doped quartz glass in which striae have a curvature radius of at least 150 mm in a surface perpendicular to an EUV-reflecting surface. The member free of exposed striae and having a high flatness is useful in EUV lithography.