Chigasaki, Japan

Hisato Tanaka


Average Co-Inventor Count = 4.1

ph-index = 2

Forward Citations = 5(Granted Patents)


Company Filing History:


Years Active: 2013-2014

Loading Chart...
3 patents (USPTO):Explore Patents

Title: Hisato Tanaka: Innovator in Substrate Processing Technology

Introduction

Hisato Tanaka is a prominent inventor based in Chigasaki, Japan. He has made significant contributions to the field of substrate processing technology, holding a total of 3 patents. His innovative designs focus on enhancing the efficiency and accuracy of substrate transfer processes.

Latest Patents

One of Hisato Tanaka's latest patents is a substrate transfer processing apparatus. This apparatus is designed to process substrates at high speeds, featuring a lightweight mounting table that reduces the load on motors, thereby lowering running costs. The mounting table is constructed from granite, ensuring a flat and smooth surface for high-precision substrate positioning. Another notable patent is a substrate stage that facilitates high-speed substrate transfer. This stage incorporates auxiliary mounting tables and a unique lower rail system that maintains linearity, allowing for seamless movement during the transfer process.

Career Highlights

Hisato Tanaka is currently employed at Ulvac, Inc., where he continues to develop cutting-edge technologies in substrate processing. His work has significantly impacted the efficiency of manufacturing processes in various industries.

Collaborations

Tanaka collaborates with talented coworkers, including Yuya Inoue and Tamotsu Tanifuji, who contribute to the innovative environment at Ulvac, Inc.

Conclusion

Hisato Tanaka's contributions to substrate processing technology exemplify his commitment to innovation and efficiency. His patents reflect a deep understanding of the technical challenges in the field, making him a valuable asset to the industry.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…