Nirasaki, Japan

Hisashi Higuchi


Average Co-Inventor Count = 8.0

ph-index = 1


Company Filing History:


Years Active: 2020-2025

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2 patents (USPTO):

Title: Hisashi Higuchi: Innovator in Semiconductor Manufacturing

Introduction

Hisashi Higuchi is a prominent inventor based in Nirasaki, Japan. He has made significant contributions to the field of semiconductor manufacturing, particularly through his innovative methods and techniques. His work has been instrumental in advancing the technology used in semiconductor devices.

Latest Patents

Hisashi Higuchi holds a patent for a method of manufacturing a semiconductor device and a method of forming a metal oxide film. This patent describes a process that involves accommodating a workpiece in a chamber and supplying a precursor gas containing a metal complex to form a precursor layer. The method further includes supplying an oxidizing gas to oxidize the precursor layer, resulting in the formation of a metal oxide layer. The process also involves supplying an HO removal gas to eliminate HO adsorbed onto the metal oxide layer, executed through multiple cycles that enhance the efficiency of the manufacturing process. His patent is a testament to his expertise and innovative thinking in the semiconductor industry.

Career Highlights

Higuchi is associated with Tokyo Electron Limited, a leading company in the semiconductor manufacturing sector. His role at the company has allowed him to work on cutting-edge technologies and contribute to the development of advanced semiconductor devices. His dedication to innovation has positioned him as a key figure in the industry.

Collaborations

Throughout his career, Hisashi Higuchi has collaborated with talented individuals such as Taiki Kato and Kosuke Yamamoto. These collaborations have fostered a creative environment that encourages the exchange of ideas and the development of groundbreaking technologies.

Conclusion

Hisashi Higuchi's contributions to semiconductor manufacturing through his innovative patent and collaborative efforts highlight his importance in the field. His work continues to influence the development of advanced technologies in the semiconductor industry.

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