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For the Inventor, By the Inventor

Kitakyushu, Japan

Hiroyasu Nishida

This inventor holds 31 USPTO granted patents and 2 published patent applications and 2 EPO patents, primarily in Inorganic Particle Technology. Top assignees: Catalysts & Chemicals Industries Co., Ltd., Jgc Catalysts & Chemicals Ltd., Dai Nippon Printing Co., Ltd.. Active years: 1990-2022.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hiroyasu Nishida. Retrieved from https://idiyas.com/inventor/hiroyasu-nishida

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 31 

% Patents Active = 77.4

 

Average Co-Inventor Count = 3.2

ph-index = 6

Forward Citations = 92(Granted Patents)


Location History:

  • Fukuoka-ken, JP (2004 - 2008)
  • Kitakyushi, JP (2011)
  • Kawasaki, JP (2017)
  • Fukuoka, JP (1990 - 2022)
  • Kitakyushu, JP (1998 - 2022)

Company Filing History:

goldMedal15 out of 102 
 
Catalysts & Chemicals Industries Co., Ltd.
 patents
silverMedal15 out of 125 
 
Jgc Catalysts & Chemicals Ltd.
 patents
bronzeMedal1 out of 3,208 
 
Dai Nippon Printing Co., Ltd.
 patents
4. 1 out of 834,570 
Other
 patents
where one patent can have more than one assignee

Years Active: 1990-2022

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Areas of Expertise:
Nanobubble
Silica Dispersion
Polishing Composition
Ceria-based Composite
Antireflective Laminate
Inorganic Compound
Thermoplastic Resin
Coating Composition
Fine Particle
Dental Material
Polishing Agent
Dispersion Liquid
31 patents (USPTO):Explore Patents
1. 11505717 - Nanobubble-containing inorganic oxide fine particle and abrasive containing same (2022-11-22),
2. 11267715 - Ceria-based composite fine particle dispersion, production method therefor, and polishing abrasive grain dispersion including ceria-based composite fine particle dispersion (2022-03-08),
3. 11059997 - Polishing composition (2021-07-13),
4. 10759665 - Silica particle dispersion and method for producing the same (2020-09-01),
5. 10160894 - Non-spherical silica sol, process for producing the same, and composition for polishing (2018-12-25),
6. 9683108 - Antireflective laminate (2017-06-20),
7. 9441139 - Process for producing silica-based fine particle dispersion sols, silica-based fine particle dispersion sol, coating composition containing the dispersion sol, curable coating film, and substrate having the curable coating film (2016-09-13),
8. 9272916 - Non-spherical silica sol, process for producing the same, and composition for polishing (2016-03-01),
9. 9039828 - Process for producing silica-based fine particle dispersion sols, silica-based fine particle dispersion sol, coating composition containing the dispersion sol, curable coating film, and substrate having the curable coating film (2015-05-26),
10. 8585791 - Method of producing nodular silica sol (2013-11-19),
11. 8187351 - Sol of spinous inorganic oxide particles, method of producing the sol, and polishing agent containing the sol (2012-05-29),
12. 8118898 - Spinous silica-based sol and method of producing the same (2012-02-21),
13. 8029898 - Inorganic compound particle (2011-10-04),
14. 7727602 - Recording sheet with ink receptive layer and coating liquid for forming ink receptive layer (2010-06-01),
15. 7575803 - Inorganic compound particle and process for preparation thereof (2009-08-18),

Title: The Innovative Journey of Hiroyasu Nishida

Introduction:

Hiroyasu Nishida, a visionary inventor hailing from Kitakyushu, JP, has left an indelible mark on the global tech community with his passion for innovation and relentless pursuit of excellence. With 31 patents to his name, Nishida's work continues to inspire and shape the future of inventors and innovators worldwide.

Latest Patents:

Nishida's latest patents showcase his groundbreaking work in the field of nanotechnology and materials science. One of his recent inventions includes a nanobubble-containing inorganic oxide fine particle dispersion, which exhibits excellent concentration stability in abrasive processes. Another patent highlights a ceria-based composite particle dispersion designed for high-speed and precise polishing, catering to a wide range of materials including silica film and Si wafer.

Career Highlights:

Throughout his illustrious career, Nishida has made significant contributions to companies such as Catalysts & Chemicals Industries Co., Ltd. and JGC Catalysts & Chemicals Ltd. His innovative spirit and dedication to pushing the boundaries of technology have earned him a stellar reputation in the industry.

Collaborations:

Nishida has collaborated with esteemed colleagues such as Michio Komatsu and Kazuhiro Nakayama, further enriching his portfolio of innovative projects. These collaborations have led to the development of cutting-edge technologies and solutions that have garnered acclaim within the tech community.

Conclusion:

In conclusion, Hiroyasu Nishida's unwavering commitment to innovation and his groundbreaking inventions have established him as a pioneering figure in the global tech landscape. His work serves as a testament to the power of visionary thinking and the transformative impact of innovative technologies. Nishida's legacy continues to inspire a new generation of inventors and innovators to push the boundaries of what is possible in the world of technology and beyond.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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