Jgc Catalysts & Chemicals Ltd.

Catalysts & Chemicals Industries Co., Ltd.

Other

Dai Nippon Printing Co., Ltd.

Hiroyasu Nishida

Michio Komatsu

Kazuhiro Nakayama

Toshiharu Hirai

Yoshinori Wakamiya

Akira Nakashima

Ryo Muraguchi

Tsuguo Koyanagi

Naoyuki Enomoto

Yuji Tawarazako

Yoshichika Tanaka

Mitsuru Nakai

Mitsuaki Kumazawa

Goro Sato

Kazuaki Inoue

Yoichi Ishihara

Osamu Yoshida

Manabu Watanabe

Takeo Ito

Toshio Yoshihara

Hidemi Matsuda

Seiji Shinohara

Masayuki Matsuda

Yukihiro Iwasaki

Masafumi Hirai

Shinya Usuda

Teruo Migita

Kei Mihara

Kei-ichi Mihara

Utako Mizuno

Midori Nakajo

Mami Tokunaga

Noboru Senju

Kazuhiko Yui

Yoshimi Otani

Hiroo Yoshitome

An object of the present invention is to provide a nanobubble-containing inorganic oxide fine particle dispersion having excellent concentration stability in a process used as an abrasive. The object is achieved by the nanobubble-containing inorganic oxide fine particle dispersion including: inorganic oxide fine particles having an average particle size of 1 to 500 nm and containing fine particles containing Ce; and nanobubbles having an average cell size of 50 to 500 nm and being at least one non-oxidizing gas selected from a group consisting of Nand H.

Nanobubble-containing inorganic oxide fine particle and abrasive containing same

Aiming at providing a ceria-based composite particle dispersion capable of polishing silica film, Si wafer or even hard-to-process material at high polishing rate, and can give high surface accuracy, disclosed is a ceria-based composite particle dispersion that contains a ceria-based composite particle that has an average particle size of 50 to 350 nm, to solve the aforementioned problem, featured by that the ceria-based composite particle has a mother particle, a cerium-containing silica layer, a child particle, and an easily soluble silica-containing layer; the mother particle contains amorphous silica as a major ingredient; the child particle contains crystalline ceria as a major ingredient; ratio of the mass of the easily soluble silica-containing layer relative to the mass of the ceria-based composite particle falls in a specific range; mass ratio of silica and ceria in the ceria-based composite particle falls in a specific range; the ceria-based composite particle, when analyzed by X-ray diffractometry, shows only a crystal phase of ceria; and the ceria-based composite particle has an average crystallite size of the crystalline ceria, when analyzed by X-ray diffractometry, of 10 to 25 nm.

Ceria-based composite fine particle dispersion, production method therefor, and polishing abrasive grain dispersion including ceria-based composite fine particle dispersion

A polishing composition comprising an abrasive grain; a modified microfibril cellulose in which at least a part of the cellulose units has a hydroxyl group at the C6 position oxidized to a carboxyl group; and a dispersion medium, wherein each content of Na and K is 100 ppm or less relative to the solids weight.

Polishing composition

Provided is a dispersion containing high-purity silica particles and a method for producing the same. A first solution containing a silane alkoxide and a second solution containing fine bubbles having an average bubble diameter of 40 nm to 10 &#x3bc;m are mixed. Thus, the silane alkoxide is hydrolyzed without using an alkaline catalyst in a liquid phase containing the fine bubbles, so that uniform silica particles having an average particle size of 3 to 10 nm are produced. Further, hydrolysis is carried out by adding a hydrolyzable metal compound to the dispersion containing the silica particles in the presence of the fine bubbles and the alkaline catalyst. Thus, the silica particles are grown, so that a uniform silica-based particle dispersion containing particles having an average particle size of more than 10 nm and 300 nm or less is produced.

Silica particle dispersion and method for producing the same

Provided is a non-spherical silica sol containing non-spherical silica fine particles dispersed in a dispersion medium, the non-spherical silica fine particles having an average particle diameter in a range of 3 to 150 nm as measured by dynamic light scattering, a minor-diameter/major-diameter ratio in a range of 0.01 to 0.8, and a specific surface area in a range of 10 to 800 m/g, and also having a plurality of wart-like projections on the surfaces thereof, and a process for producing the non-spherical silica sol. The non-spherical silica fine particles contained in the non-spherical silica sol have a unique structure different from the structure of ordinary non-spherical silica fine particles.

Non-spherical silica sol, process for producing the same, and composition for polishing

There is provided an antireflective laminate having a low refractive index and excellent mechanical strength, which comprises a coating layer of an ionizing radiation curing-type resin composition comprising ionizing radiation curing group-containing hollow silica fine particles. The antireflective laminate comprises a light transparent base material and at least a low refractive index layer having a refractive index of not more than 1.45 provided on the light transparent base material, wherein the low refractive index layer comprises an ionizing radiation curing-type resin composition and silica fine particles having an outer shell layer with the interior of the silica fine particles being porous or void, and, for a part or all of the silica fine particles, at least a part of the surface of the silica fine particle has been treated with an ionizing radiation curing group-containing silane coupling agent.

Antireflective laminate

Provided are silica-based fine particle dispersion sols, processes for producing the sols, coating compositions containing the dispersion sol, curable coating films obtained from the coating composition, and substrates having the coating film. The process including (1) mixing an aqueous aluminate solution to an alkaline silica sol which contains water-dispersible silica fine particles in a given ratio; (2) heating the mixture liquid obtained in step (1) to 60 to 200&#xb0; C. and stirring the mixture liquid at the temperature for 0.5 to 20 hours; and (3) contacting the mixture liquid obtained in step (2) with a cation exchange resin to remove by ion exchange alkali metal ions contained in the mixture liquid and thereby controlling the pH of the mixture liquid to be in the range of 3.0 to 6.0.

Process for producing silica-based fine particle dispersion sols, silica-based fine particle dispersion sol, coating composition containing the dispersion sol, curable coating film, and substrate having the curable coating film

Provided are silica-based fine particle dispersion sols, processes for producing the sols, coating compositions containing the dispersion sol, curable coating films obtained from the coating composition, and substrates having the coating film. A process includes (1) mixing an aqueous aluminate solution to an alkaline silica sol which contains water-dispersible silica fine particles in a given ratio; (2) heating the mixture liquid obtained in the step (1) to 60 to 200&#xb0; C. and stirring the mixture liquid at the temperature for 0.5 to 20 hours; and (3) contacting the mixture liquid obtained in the step (2) with a cation exchange resin to remove by ion exchange alkali metal ions contained in the mixture liquid and thereby controlling the pH of the mixture liquid to be in the range of 3.0 to 6.0.

In producing nodular silica sol, a polymerized silicic acid solution with viscosity of silicic acid from 0.9 to 100 mPa&#xb7;s is prepared by aging a silicic acid solution with pH from 1.0 to 7.0 and silica concentration from 0.05 to 3.0% by weight at a temperature from 1 to 98&#xb0; C. Then, a seed liquid is prepared by adding an alkali to the polymerized solution to adjust the pH from 10 to 12.5 and heating the resultant mixture solution at a temperature from 50 to 150&#xb0; C. According to necessity, an alkali is added to the obtained seed liquid to adjust the pH in from 9 to 12.5. Finally, a silicic acid solution or a highly purified silicic acid solution is dropped to the seed liquid at a temperature from 20 to 98&#xb0; C. continuously or intermittently for building up.

Method of producing nodular silica sol

The present invention provides a sol of spinous inorganic oxide particles not containing coarse particles, in which particles having extremely homogeneous particles are dispersed in a solvent. An acidic silicic acid is added to a dispersion liquid of core particles to grow core particles, and then again the acidic silicic acid is added at the addition rate 1.2 to 1.8 higher than that in the previous step to prepare a sol of spinous inorganic oxide particles. Then the sol is subjected to centrifugation to remove coarse particles having the diameter of 800 nm or more, thus spinous inorganic oxide particles having peculiar form such as a spinous one being obtained.

Sol of spinous inorganic oxide particles, method of producing the sol, and polishing agent containing the sol

The present invention provides a sol of spinous silica-based particles in which silica-based particles having peculiar forms, spinous forms are dispersed in a solvent. The spinous silica-based particles have verrucous projections formed on surfaces of spherical silica-based particles. In the spinous particles, a value of the surface roughness (SA/SASAindicating a specific surface area measured by the BET method or the Sears method and SAindicating a specific surface area converted from an average particle diameter (D) measured by the image analysis method) is in the range from 1.7 to 10. Furthermore the average diameter (D) measured by the image analysis method is in the range from 7 to 150 nm.

Spinous silica-based sol and method of producing the same

Inorganic compound particles constituted of a shell, a porous matter or a cavity enclosed therein, and the porous matter or the cavity being kept unchanged in a subsequently formed transparent coating film.

Inorganic compound particle

A recording sheet with an ink-receptive layer which can be used not only for dye type inks but also for pigment type inks is provided. Also provided is a coating liquid for forming an ink-receptive layer. The recording sheet with an ink-receptive layer includes a substrate sheet and an ink-receptive layer formed thereon, wherein the ink-receptive layer includes (i) fibrous crystalline particles on surfaces of which a cationic hydrated metal compound is supported and (ii) a binder. The fibrous crystalline particles have an average fiber diameter (D) of 0.1 to 2 &#x3bc;m, an average fiber length (L) of 1 to 200 &#x3bc;m and a ratio (aspect ratio) of an average fiber length (L) to an average fiber diameter (D) of 5 to 500.

Recording sheet with ink receptive layer and coating liquid for forming ink receptive layer

Inorganic compound particle and process for preparation thereof

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Kitakyushu, Japan

Hiroyasu Nishida