Yokohama, Japan

Hiroshige Goto

This inventor holds 24 USPTO granted patents and 1 EPO patent, primarily in Solid-State Imaging. Top assignees: Kabushiki Kaisha Toshiba, Toppan Inc.. Active years: 1989-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hiroshige Goto. Retrieved from https://idiyas.com/inventor/hiroshige-goto

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 62.5


Average Co-Inventor Count = 1.5

ph-index = 6

Forward Citations = 155(Granted Patents)


Location History:

  • Kanagawa, JP (2007)
  • Kanagawa-ken, JP (2006 - 2010)
  • Yokohama, JP (1989 - 2011)

Company Filing History:


Years Active: 1989-2026

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Areas of Expertise:
Solid-State Image Sensor
Imaging Device
Amplification-Type
CMOS Image Sensor
Signal Storage Section
Charge Transfer Device
Optical Reading Device
Multi-Chip Imaging
High-Speed Readout
Manufacturing Method
Junction Gate FET
Picture Imaging
24 patents (USPTO):Explore Patents

Title: Hiroshige Goto: Innovator in Solid-State Imaging Technology

Introduction

Hiroshige Goto is a prominent inventor based in Yokohama, Japan, recognized for his significant contributions to the field of solid-state imaging devices. With an impressive portfolio of 22 patents, Goto has established himself as a key player within the technology sector, particularly through his work at Kabushiki Kaisha Toshiba.

Latest Patents

Among his latest inventions, Goto has developed a solid-state imaging device that features a signal storage section consisting of a highly doped area. This device includes individual unit cells on a semiconductor substrate, integrating a first p-type well that defines an n-type photoelectric conversion region. Additionally, a second p-type well is formed in the surface of the photoelectric conversion region, which houses a signal scanning circuit section. Goto's inventions also focus on a method of manufacturing solid-state imaging devices, emphasizing the importance of a barrier layer made from p-type semiconductor material that enhances the photoelectric conversion part's functionality.

Career Highlights

Hiroshige Goto’s career has been marked by his tenure at Kabushiki Kaisha Toshiba, where he has pushed the boundaries of imaging technology. His dedication to research and development has led to innovative solutions in the semiconductor field, significantly advancing the capabilities of solid-state imaging applications.

Collaborations

Throughout his career, Goto has collaborated with talented professionals in the industry, including his coworkers Tetsuya Yamaguchi and Hisanori Ihara. These collaborations have fostered an environment of innovation and excellence, enabling the creation of cutting-edge technologies that impact various sectors, from consumer electronics to industrial applications.

Conclusion

Hiroshige Goto continues to be an influential figure in the world of invention, with a strong focus on solid-state imaging technologies. His numerous patents reflect a commitment to innovation, and his work at Kabushiki Kaisha Toshiba showcases the importance of collaboration in achieving technological advancements. As the industry evolves, Goto's contributions are likely to leave a lasting impact on future developments in imaging technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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