Hyogo, Japan

Hiroshi Matsuo

This inventor holds 8 USPTO granted patents. Top assignees: Mitsubishi Denki Kabushiki Kaisha, Ryoden Semiconductor System Engineering Corporation, Panasonic Corporation. Active years: 1998-2012.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hiroshi Matsuo. Retrieved from https://idiyas.com/inventor/hiroshi-matsuo-kmo08pf4

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 75.0

Average Co-Inventor Count = 5.5

ph-index = 4

Forward Citations = 32(Granted Patents)


Company Filing History:


Years Active: 1998-2012

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8 patents (USPTO):Explore Patents

Title: Hiroshi Matsuo: Innovator in Induction Heating and Semiconductor Manufacturing

Introduction

Hiroshi Matsuo is a prominent inventor based in Hyogo, Japan. He has made significant contributions to the fields of induction heating and semiconductor manufacturing. With a total of 8 patents to his name, Matsuo has developed innovative technologies that enhance efficiency and safety in various applications.

Latest Patents

One of Matsuo's latest inventions is an induction heater that features an electrical conductor positioned between a heating coil and a top plate. This electrical conductor includes an extended portion that extends downward from its outer periphery. At the tip of this extended portion, a connector is provided for coupling to a low-potential part. Additionally, a thermal-connection reducing means is integrated into the design to minimize heat conduction to connected parts. This innovative structure not only reduces buoyancy and electrostatic shielding but also ensures a compact and highly reliable apparatus, eliminating the risk of electric shock and preventing uplift of objects being heated.

Another notable patent is a method for manufacturing semiconductor devices. This improved etching method allows for the formation of a silicon nitride film with an adequate thickness at the sidewall portion of a pattern. By employing plasma of mixed gases containing CH₄ and O₂, a sidewall spacer of the silicon nitride film is formed in a self-aligned manner. This advancement enhances the precision and effectiveness of semiconductor manufacturing processes.

Career Highlights

Throughout his career, Matsuo has worked with notable companies, including Mitsubishi Electric Corporation. His experience in these organizations has contributed to his expertise and innovative capabilities in the field of technology.

Collaborations

Matsuo has collaborated with talented individuals such as Yuichi Yokoyama and Shinya Inoue. These partnerships have fostered a creative environment that has led to the development of groundbreaking technologies.

Conclusion

Hiroshi Matsuo is a distinguished inventor whose work in induction heating and semiconductor manufacturing has made a lasting impact. His innovative patents reflect his commitment to advancing technology and improving safety and efficiency in various applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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