Kanagawa, Japan

Hiroshi Komano


Average Co-Inventor Count = 3.4

ph-index = 12

Forward Citations = 447(Granted Patents)


Location History:

  • Samukawa, JP (1989)
  • Koza-gun, JP (1998 - 1999)
  • Koza, JP (1999)
  • Samukawa-machi, JP (2000 - 2001)
  • Kanagawa-ken, JP (1996 - 2005)
  • Kanagawa, JP (1994 - 2008)

Company Filing History:


Years Active: 1989-2008

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42 patents (USPTO):Explore Patents

Title: **Innovative Contributions of Hiroshi Komano in Photoresist Technology**

Introduction

Hiroshi Komano is a renowned inventor based in Kanagawa, Japan, recognized for his significant contributions to the field of photoresist technology. With a remarkable portfolio consisting of 42 patents, he has made noteworthy advancements that enhance electronic manufacturing processes.

Latest Patents

Among his latest innovations, Komano has developed negative photoresist compositions specifically designed for the formation of thick films. This composition includes a combination of (A) a novolak resin, (B) a plasticizer, (C) a crosslinking agent, and (D) an acid generator. The application of this composition results in a photoresist film with a thickness ranging from 5 to 100 micrometers. Additionally, the same composition can be applied to substrates of electronic components, where it is patterned and plated to yield bumps essential for electronic circuitry.

Career Highlights

Komano's career spans multiple key positions in reputable companies, notably at Tokyo Ohka Kogyo Co., Ltd. and NEC Corporation. His dedication and innovative mindset have propelled advancements in the manufacturing sector, particularly within the scope of electronic materials.

Collaborations

Hiroshi Komano has collaborated with esteemed professionals, including Hideo Hada and Toshimasa Nakayama. Their joint efforts have fostered substantial progress in the development of photoresist applications and have positioned them as influential figures in the industry.

Conclusion

Hiroshi Komano's illustrious career as an inventor showcases his profound impact on photoresist technology. Through his extensive patent portfolio and meaningful collaborations, he continues to inspire future innovations within the electronics manufacturing sector. His work not only enhances the efficiency of production processes but also paves the way for groundbreaking advancements in electronic component technologies.

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