The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 25, 2005

Filed:

Dec. 11, 2003
Applicants:

Toshiyuki Ogata, Chigasaki, JP;

Kotaro Endo, Kanagawa-ken, JP;

Hiroshi Komano, Kanagawa-ken, JP;

Inventors:

Toshiyuki Ogata, Chigasaki, JP;

Kotaro Endo, Kanagawa-ken, JP;

Hiroshi Komano, Kanagawa-ken, JP;

Assignee:

Tokyo Ohka Kogyo Co., Ltd., Kanagawa-ken, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C07C 6952 ; C07C 6962 ;
U.S. Cl.
CPC ...
Abstract

The invention discloses a novel ester compound of an unsaturated carboxylic acid represented by the general formulain which Ris preferably a hydrogen atom or methyl group, Ris preferably a trifluoromethyl group, Ris a non-aromatic polycyclic hydrocarbon group or, preferably, an adamantyl group and Ris preferably a hydrogen atom or methyl group. This unsaturated ester compound is polymerizable to give a (co)polymeric resin which can be used as a base resinous ingredient in a photoresist composition for light exposure with ultraviolet light of a very short wavelength by virtue of the high transparency to the short-wavelength light. A synthetic method for the preparation of the novel ester compound is disclosed.


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