The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 20, 2006
Filed:
May. 20, 2002
Applicants:
Koji Saito, Kanagawa, JP;
Kouichi Misumi, Kanagawa, JP;
Toshiki Okui, Kanagawa, JP;
Hiroshi Komano, Kanagawa, JP;
Inventors:
Koji Saito, Kanagawa, JP;
Kouichi Misumi, Kanagawa, JP;
Toshiki Okui, Kanagawa, JP;
Hiroshi Komano, Kanagawa, JP;
Assignee:
Toyko Ohka Kogyo Co., Ltd., Kanagawa, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/038 (2006.01); G03F 7/11 (2006.01); G03F 7/40 (2006.01); G03F 7/023 (2006.01);
U.S. Cl.
CPC ...
Abstract
A negative photoresist composition is used for the formation of thick films and includes (A) a novolak resin, (B) a plasticizer, (C) a crosslinking agent and (D) an acid generator. The composition is applied onto a substrate and thereby yields a photoresist film 5 to 100 μm thick. Likewise, the composition is applied onto a substrate of an electronic part, is patterned, is plated and thereby yields a bump.