Kawasaki, Japan

Toshiki Okui



Average Co-Inventor Count = 2.6

ph-index = 4

Forward Citations = 36(Granted Patents)


Location History:

  • Kanagawa, JP (1999 - 2008)
  • Kanagawa-ken, JP (2008)
  • Kawasaki, JP (2006 - 2016)

Company Filing History:


Years Active: 1999-2016

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13 patents (USPTO):Explore Patents

Title: The Innovations of Toshiki Okui

Introduction

Toshiki Okui is a prominent inventor based in Kawasaki, Japan. He has made significant contributions to the field of photoresist compositions, holding a total of 13 patents. His work focuses on developing advanced materials that enhance the manufacturing processes in various industries.

Latest Patents

One of his latest inventions is a positive-working photoresist composition for thick film formation. This innovative composition provides a chemical-amplification positive-working photoresist suitable for forming a resist film of relatively large thickness on a substrate. The composition includes a photoacid-generating agent, an alkali-insoluble resin, an alkali-soluble resin, and an organic solvent. Another notable patent is a chemically amplified positive photoresist composition for thick film, which is used to create a thick-film photoresist layer with a film thickness ranging from 10 to 150 micrometers. This composition also comprises a compound that generates acid upon irradiation, along with specific resins that enhance alkali solubility.

Career Highlights

Toshiki Okui has worked with notable companies such as Tokyo Ohka Kogyo Co., Ltd. His experience in these organizations has allowed him to refine his expertise in the development of photoresist materials and their applications in various manufacturing processes.

Collaborations

Throughout his career, Toshiki has collaborated with esteemed colleagues, including Koji Saito and Hiroshi Komano. These partnerships have contributed to the advancement of his research and the successful development of his patented technologies.

Conclusion

Toshiki Okui's contributions to the field of photoresist compositions have significantly impacted manufacturing processes. His innovative patents and collaborations highlight his dedication to advancing technology in this area.

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