This inventor holds 4 USPTO granted patents. Top assignees: Tokyo Ohka Kogyo Co., Ltd., Toyko Ohka Kogyo Co., Ltd.. Active years: 2003-2008.
Company Filing History:
Years Active: 2003-2008
Title: Innovations of Kouichi Misumi in Photoresist Technology
Introduction
Kouichi Misumi is a notable inventor based in Kanagawa, Japan. He has made significant contributions to the field of photoresist technology, particularly in the development of negative photoresist compositions. With a total of four patents to his name, Misumi's work has had a substantial impact on the electronics industry.
Latest Patents
One of Misumi's latest patents involves negative photoresist compositions for the formation of thick films. This composition includes a novolak resin, a plasticizer, a crosslinking agent, and an acid generator. The application of this composition onto a substrate results in a photoresist film that can range from 5 to 100 micrometers thick. Furthermore, this composition can be applied to electronic parts, allowing for the creation of patterned bumps through plating processes.
Career Highlights
Throughout his career, Kouichi Misumi has worked with prominent companies such as Tokyo Ohka Kogyo Co., Ltd. His expertise in photoresist technology has positioned him as a key figure in the development of innovative solutions for the electronics sector.
Collaborations
Misumi has collaborated with notable professionals in his field, including Koji Saito and Toshiki Okui. These collaborations have further enhanced his contributions to the industry.
Conclusion
Kouichi Misumi's innovations in photoresist technology demonstrate his commitment to advancing the field. His patents and collaborations reflect his significant role in shaping modern electronic manufacturing processes.