Kofu, Japan

Hiroshi Kobayashi


Average Co-Inventor Count = 3.6

ph-index = 4

Forward Citations = 73(Granted Patents)


Location History:

  • Yamanashi-Ken, JP (1998)
  • Kofu, JP (1996 - 2000)
  • Nirasaki, JP (2011)

Company Filing History:


Years Active: 1996-2011

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5 patents (USPTO):

Title: The Innovative Contributions of Hiroshi Kobayashi

Introduction

Hiroshi Kobayashi is a notable inventor based in Kofu, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 5 patents. His work focuses on advanced methods for film formation and interconnection in semiconductor devices.

Latest Patents

Kobayashi's latest patents include an insulating film forming method and a multilevel interconnection forming method for semiconductors. The insulating film forming method involves a plasma nitriding process applied to an oxide film on a substrate, followed by annealing the substrate in a low-pressure environment of 667 Pa or lower. This annealing process is performed for either 5 or 45 seconds. The plasma nitriding is executed using microwave plasma with a planar antenna featuring multiple slot holes. The multilevel interconnection forming method entails depositing a metal film containing aluminum on an insulating film of a substrate, followed by patterning the metal film to create a wiring layer. An interlayer dielectric film is then formed over the wiring layer, and a hole is created to allow selective deposition of aluminum via a CVD method. This process ensures that the aluminum fills the hole without exceeding a volume ratio of 100%. The method concludes with the formation of a metal layer that is reflowed to fill the hole completely and planarize the surface.

Career Highlights

Throughout his career, Hiroshi Kobayashi has worked with prominent companies such as Tel-Varian Limited and Tokyo Electron Limited. His experience in these organizations has contributed to his expertise in semiconductor technologies and innovations.

Collaborations

Kobayashi has collaborated with notable colleagues, including Yuichi Wada and Jiro Katsuki. Their combined efforts have further advanced the field of semiconductor technology.

Conclusion

Hiroshi Kobayashi's innovative work in semiconductor technology, particularly in film formation and interconnection methods, showcases his significant contributions to the industry. His patents reflect a commitment to advancing technology and improving semiconductor manufacturing processes.

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