The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 17, 1996

Filed:

Jun. 06, 1995
Applicant:
Inventors:

Yuichi Wada, Kofu, JP;

Jiro Katsuki, Kofu, JP;

Hiroshi Kobayashi, Kofu, JP;

Assignee:

TEL Varian Limited, Yamanashi-Ken, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C / ;
U.S. Cl.
CPC ...
20419212 ; 20419217 ; 20429811 ;
Abstract

A processing apparatus wherein a collimator which restricts sputtering directions of sputtered particles from a target comprises a plurality of slats arranged substantially parallel with each other. The respective slats constitute a louver mechanism in which rotatable rods are rotated to replace the side thereof facing the target and the side thereof facing the object-to-be-processed with each other. Because of the louver mechanism, the portion of the interior of a processing vessel belonging to the target and the portion thereof belonging to the object-to-be processed can be closed off from each other, and a side of the collimator facing the target and a side thereof facing the object-to-be-processed can be replaced with each other. As a result, the collimator has also a shutter function, and can suppress generation of particles.


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