Kanagawa, Japan

Hiroshi Ishida


Average Co-Inventor Count = 1.9

ph-index = 7

Forward Citations = 242(Granted Patents)


Location History:

  • Kanagawa, JP (1989 - 2016)
  • Tokyo, JP (2003 - 2017)

Company Filing History:


Years Active: 1989-2017

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22 patents (USPTO):Explore Patents

Title: **Innovative Contributions of Hiroshi Ishida in Pressure Detection and Semiconductor Technologies**

Introduction

Hiroshi Ishida from Kanagawa, Japan, is a prolific inventor with a remarkable portfolio of 22 patents. His innovative contributions primarily focus on advancements in pressure detection devices and semiconductor technologies. Through his work, Ishida has significantly impacted various technological fields, improving both performance and efficiency.

Latest Patents

Among Hiroshi Ishida's latest patents is a **Pressure Detection Device** and an **Intake Pressure Measurement Apparatus Using the Same**. This device features a detection space surrounded by an outer wall within a housing, with an inner wall portion integrally formed inside the detection space. The cylindrical inner wall has a sensor storage portion located between the inner wall and the outer wall, where a pressure sensor is strategically placed in a region less affected by thermal stress. This innovation showcases a thoughtful design aimed at enhancing pressure measurement accuracy.

Another notable patent is the **Manufacturing Method for Semiconductor Device**. In this process, a gate oxide film is formed on a semiconductor substrate containing a MOSFET. Following this, a first polysilicon film, serving as a gate electrode, is added. The method includes the formation of a charge storage three-layer film while ensuring the semiconductor's integrity through the addition of an anti-oxidation film on the initial polysilicon layer before further processing. This patent highlights Ishida's expertise in optimizing semiconductor fabrication processes.

Career Highlights

Hiroshi Ishida has held influential positions at notable companies, including NEC LCD Technologies and Panasonic Corporation. His experience in these firms has provided him with a strong foundation in innovation and technology development, allowing him to create impactful inventions that meet the evolving demands of the industry.

Collaborations

Throughout his career, Ishida has collaborated with esteemed colleagues, including Hidenori Ishii and Satoshi Senga. These partnerships have facilitated the exchange of ideas and fostered a collaborative environment that has driven innovation forward in their respective fields.

Conclusion

Hiroshi Ishida's work exemplifies a commitment to innovation and technological advancement. With his extensive patent portfolio and significant contributions to pressure detection devices and semiconductor technologies, he continues to influence the landscape of modern technology. His achievements are a testament to the vital role inventors play in shaping the future of innovation.

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