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For the Inventor, By the Inventor

Funabashi, Japan

Hiroshi Inazumachi

This inventor holds 6 USPTO granted patents. Top assignees: Sumitomo Osaka Cement Co., Ltd., Tokyo Electron Limited. Active years: 2004-2012.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hiroshi Inazumachi. Retrieved from https://idiyas.com/inventor/hiroshi-inazumachi

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 6

% Patents Active = 83.3

Average Co-Inventor Count = 3.2

ph-index = 4

Forward Citations = 502(Granted Patents)


Location History:

  • Tokyo, JP (2005)
  • Funabashi, JP (2004 - 2012)

Company Filing History:

goldMedal6 out of 482 
 
Sumitomo Osaka Cement Co., Ltd.
 patents
silverMedal2 out of 10,904 
 
Tokyo Electron Limited
 patents
where one patent can have more than one assignee

Years Active: 2004-2012

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6 patents (USPTO):Explore Patents
1. 8284538 - Electrostatic chuck device (2012-10-09),
2. 8264813 - Electrostatic chuck device (2012-09-11),
3. 7619870 - Electrostatic chuck (2009-11-17),
4. 6863281 - Chucking apparatus and production method for the same (2005-03-08),
5. 6838646 - Susceptor device (2005-01-04),
6. 6693789 - Susceptor and manufacturing method thereof (2004-02-17),

Title: Hiroshi Inazumachi: Innovator in Electrostatic Chuck Devices

Introduction

Hiroshi Inazumachi is a notable inventor based in Funabashi, Japan. He has made significant contributions to the field of electrostatic chuck devices, holding a total of 6 patents. His work focuses on enhancing the performance and efficiency of plasma processing apparatuses.

Latest Patents

Inazumachi's latest patents include innovative designs for electrostatic chuck devices. One of his patents describes an electrostatic chuck device that features an electrostatic chuck section, a metal base section, and a dielectric plate. This device is designed to improve the in-plane uniformity of electric field intensity during plasma processes. Another patent outlines a similar electrostatic chuck device that incorporates a composite sintered body containing insulating ceramic and silicon carbide, ensuring high performance in plasma processing applications.

Career Highlights

Throughout his career, Inazumachi has worked with prominent companies such as Sumitomo Osaka Cement Co., Ltd. and Tokyo Electron Limited. His experience in these organizations has contributed to his expertise in developing advanced electrostatic chuck technologies.

Collaborations

Inazumachi has collaborated with notable colleagues, including Mamoru Kosakai and Yukio Miura. Their combined efforts have led to advancements in the field of electrostatic chuck devices.

Conclusion

Hiroshi Inazumachi's contributions to the development of electrostatic chuck devices have significantly impacted the field of plasma processing. His innovative patents and collaborations with industry professionals highlight his role as a leading inventor in this technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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