Koshi, Japan

Hiroshi Ichinomiya


Average Co-Inventor Count = 3.6

ph-index = 3

Forward Citations = 12(Granted Patents)


Location History:

  • Kumamoto, JP (2022)
  • Koshi, JP (2016 - 2024)

Company Filing History:


Years Active: 2016-2024

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8 patents (USPTO):Explore Patents

Title: **Innovative Contributions of Hiroshi Ichinomiya in Semiconductor Technology**

Introduction

Hiroshi Ichinomiya, an esteemed inventor based in Koshi, Japan, has made significant strides in the field of semiconductor technology. With a remarkable portfolio of 8 patents, Ichinomiya has developed methods and apparatuses that are integral to advanced substrate processing techniques.

Latest Patents

Among his latest innovations, Ichinomiya has introduced a developing treatment method aimed at refining the manufacturing processes of resist films on substrates. This method involves a series of meticulous steps: supplying a developing solution to create a resist pattern, cleaning the substrate with a water-based cleaning liquid, applying a water-soluble polymer to form a hydrophilic layer, and finally cleaning the substrate with a rinse liquid. Notably, the method includes unique processes for accelerating and decelerating the substrate's rotation speed to optimize efficiency.

Furthermore, he has patented a substrate processing method which encompasses the supply of a developing liquid to create resist patterns and incorporates multiple cycles of cleaning processing with modifying and rinse liquids. This innovative approach not only enhances the quality of the final product but also ensures thorough drying of the substrate after processing.

Career Highlights

Hiroshi Ichinomiya is currently employed at Tokyo Electron Limited, a leading company in the semiconductor industry. His work focuses on innovating and streamlining processes that are essential for the production of electronic components.

Collaborations

Collaboration plays an essential role in Ichinomiya's research and development endeavors. He works closely with notable colleagues, including Kousuke Yoshihara and Akiko Kai, who contribute their expertise to enhance the effectiveness of their projects. Together, they tackle complex challenges in semiconductor manufacturing, pushing the boundaries of what is achievable in the industry.

Conclusion

Hiroshi Ichinomiya's contributions to the semiconductor field exemplify the importance of innovation in driving technological advancement. His dedication to improving substrate processing techniques through his patents showcases his commitment to excellence and collaboration within the ever-evolving landscape of semiconductor technology.

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