The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 08, 2023
Filed:
Dec. 15, 2017
Applicant:
Tokyo Electron Limited, Tokyo, JP;
Inventors:
Akiko Kai, Koshi, JP;
Kousuke Yoshihara, Koshi, JP;
Kouichirou Tanaka, Koshi, JP;
Hiroshi Ichinomiya, Koshi, JP;
Assignee:
Tokyo Electron Limited, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/32 (2006.01); H01L 21/67 (2006.01); H01L 21/687 (2006.01); G03F 7/00 (2006.01);
U.S. Cl.
CPC ...
G03F 7/32 (2013.01); H01L 21/6715 (2013.01); H01L 21/67051 (2013.01); H01L 21/67098 (2013.01); H01L 21/68764 (2013.01); G03F 7/70925 (2013.01);
Abstract
A developing treatment method performs a developing treatment on a resist film on a substrate. The method includes: a pattern forming step of forming a resist pattern by supplying a developing solution to the substrate and developing the resist film on the substrate; a coating step of coating the developed substrate with an aqueous solution of a water-soluble polymer; and a rinse step of cleaning the substrate by supplying a rinse solution to the substrate coated with the aqueous solution of the water-soluble polymer.