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Hiroshi Echizen

This inventor holds 27 USPTO granted patents, primarily in Film Formation Technology. Top assignee: Canon Kabushiki Kaisha. Active years: 1986-2016.

USPTO Granted Patents = 27

% Patents Active = 77.8

Average Co-Inventor Count = 3.3

ph-index = 11

Forward Citations = 355(Granted Patents)

Location History:

Nagahama, JP (1997 - 2002)
Tokyo, JP (1986 - 2004)
Nara, JP (2004 - 2010)
Kawasaki, JP (2016)

Company Filing History:

27 out of 92,901

Canon Kabushiki Kaisha

Years Active: 1986-2016

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Areas of Expertise:

Photoelectric Conversion

Sputtering Method

Microwave Chemical Vapor Deposition

Transparent Conductive Film

Deposited Film Formation

Wet Process Gas Treatment

Illuminance Measurement

Film Forming Apparatus

Photovoltaic Device Production

Continuous Film Formation

Exposure Method

Plasma Processing

27 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 9312289 - Photoelectric conversion apparatus, manufacturing method thereof, and image pickup system (2016-04-12),

2. 7641382 - Leak judgment method, and computer-readable recording medium with recorded leak-judgment-executable program (2010-01-05),

3. 7288140 - Wet process gas treatment apparatus (2007-10-30),

4. 6930025 - Transparent conductive film formation process, photovoltaic device production process, transparent conductive film, and photovoltaic device (2005-08-16),

5. 6860974 - Long-Term sputtering method (2005-03-01),

6. 6821317 - Wet-process gas treatment method and wet-process gas treatment apparatus (2004-11-23),

7. 6783640 - Sputtering method and sputtering apparatus (2004-08-31),

8. 6740210 - Sputtering method for forming film and apparatus therefor (2004-05-25),

9. 6350489 - Deposited-film forming process and deposited-film forming apparatus (2002-02-26),

10. 6338872 - Film forming method (2002-01-15),

11. 6273955 - Film forming apparatus (2001-08-14),

12. 6253703 - Microwave chemical vapor deposition apparatus (2001-07-03),

13. 6113732 - Deposited film forming apparatus (2000-09-05),

14. 5714010 - Process for continuously forming a large area functional deposited film (1998-02-03),

15. 5700326 - Microwave plasma processing apparatus (1997-12-23),

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Profile summary based on public USPTO records.

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