The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 16, 2005
Filed:
Jan. 31, 2002
Akiya Nakayama, Nara, JP;
Hiroshi Echizen, Nara, JP;
Yasuyoshi Takai, Nara, JP;
Naoto Okada, Nara, JP;
Shigeo Kiso, Nara, JP;
Akiya Nakayama, Nara, JP;
Hiroshi Echizen, Nara, JP;
Yasuyoshi Takai, Nara, JP;
Naoto Okada, Nara, JP;
Shigeo Kiso, Nara, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
In a process for forming on a substrate a transparent conductive film having crystallizability, the process comprises a first step of forming a film at a first film formation rate and a second step of forming a film at a second film formation rate, and the relationship between film formation rates in the respective steps satisfies:2≦(second film formation rate)/(first film formation rate)≦100;which provides a process for producing a transparent conductive film by a deposition process advantageous for cost reduction, which can form in a short time a transparent conductive film having an uneven surface profile with a high light-confining effect, and can bring about an improvement in photovoltaic performance and enjoy a high mass productivity when applied to the formation of multi-layer structure of photovoltaic devices.