Hironori Matsuoka

Title: Hironori Matsuoka: Innovator in Plasma Etching Technology

Introduction

Hironori Matsuoka is a notable inventor based in Miyagi, Japan. He has made significant contributions to the field of plasma etching technology, holding a total of 3 patents. His work focuses on methods that enhance the precision and efficiency of etching processes, particularly in the semiconductor industry.

Latest Patents

Matsuoka's latest patents include a method for etching organic film and a plasma etching device. In his method for etching an organic film, a target object with an organic film is placed in a processing chamber. A processing gas containing COS gas and Ogas is then supplied to the chamber, along with microwave energy for plasma excitation, allowing for effective etching of the organic film. Another patent describes an etching method that selectively etches a second region made of silicon oxide in a target object, compared to a first region made of silicon. This method involves processing the target object with plasma from a first processing gas containing fluorocarbon and fluorohydrocarbon, followed by treatment with plasma from a second processing gas containing fluorocarbon.

Career Highlights

Hironori Matsuoka is currently employed at Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His innovative approaches to etching technology have positioned him as a key figure in advancing the capabilities of semiconductor fabrication.

Collaborations

Matsuoka has collaborated with notable colleagues such as Hiroto Ohtake and Akinori Kitamura. Their combined expertise has contributed to the development of cutting-edge technologies in the field.

Conclusion

Hironori Matsuoka's contributions to plasma etching technology reflect his dedication to innovation and excellence. His patents and work at Tokyo Electron Limited continue to influence the semiconductor industry significantly.