The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 22, 2016
Filed:
Mar. 26, 2013
Applicant:
Tokyo Electron Limited, Tokyo, JP;
Inventors:
Hiroyuki Takaba, Miyagi, JP;
Hironori Matsuoka, Miyagi, JP;
Assignee:
TOKYO ELECTRON LIMITED, Tokyo, JP;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/306 (2006.01); H01L 21/311 (2006.01); H01L 21/027 (2006.01); H01J 37/32 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
H01L 21/31138 (2013.01); H01J 37/3222 (2013.01); H01J 37/32192 (2013.01); H01J 37/32449 (2013.01); H01J 37/32816 (2013.01); H01L 21/0276 (2013.01); H01L 21/67069 (2013.01); H01J 2237/327 (2013.01); H01J 2237/334 (2013.01);
Abstract
In a method for etching an organic film according to an embodiment, a target object that has an organic film is set in a processing chamber. Then, a processing gas containing COS gas and Ogas is supplied to the processing chamber and a microwave for plasma excitation is supplied to the inside of the processing chamber to etch the organic film.