Yamanashi, Japan

Hiromitsu Sakaue

USPTO Granted Patents = 9 

Average Co-Inventor Count = 1.6

ph-index = 1

Forward Citations = 6(Granted Patents)


Location History:

  • Nirasaki, JP (2020)
  • Yamanashi, JP (2013 - 2023)

Company Filing History:


Years Active: 2013-2024

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9 patents (USPTO):Explore Patents

Title: Hiromitsu Sakaue: Innovator in Substrate Processing Technologies

Introduction

Hiromitsu Sakaue is a prominent inventor based in Yamanashi, Japan. He has made significant contributions to the field of substrate processing, holding a total of 9 patents. His work focuses on enhancing the efficiency and effectiveness of substrate transfer and processing systems.

Latest Patents

Sakaue's latest patents include a substrate transfer apparatus, a substrate processing system, and a substrate processing method. The substrate transfer apparatus is designed for transferring a substrate to a substrate processing apparatus in a reduced pressure atmosphere. This innovative apparatus features a substrate holder that securely holds the substrate and a substrate measurer that accurately measures the position of the substrate relative to the holder. Additionally, his vacuum processing device incorporates a loading/unloading port, a normal pressure transfer chamber, and a vacuum transfer chamber, all arranged sequentially. This design optimizes the movement range of wafers and enhances the overall processing efficiency.

Career Highlights

Throughout his career, Sakaue has worked with notable companies, including Tokyo Electron Limited. His experience in these organizations has allowed him to develop and refine his innovative technologies in substrate processing.

Collaborations

Sakaue has collaborated with esteemed colleagues such as Takashi Horiuchi and Hirofumi Yamaguchi. Their combined expertise has contributed to advancements in the field of substrate processing.

Conclusion

Hiromitsu Sakaue's contributions to substrate processing technologies have established him as a key figure in the industry. His innovative patents and collaborations continue to influence advancements in this critical area of technology.

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