Location History:
- Shirane, JP (1995)
- Shirane-machi, JP (1997)
Company Filing History:
2 out of 42,517 
2 out of 21 
2 out of 10,346 
Years Active: 1995-1997
Title: Hiromitsu Matsuo: Innovator in Plasma Etching Technology
Introduction
Hiromitsu Matsuo is a notable inventor based in Shirane, Japan. He has made significant contributions to the field of plasma etching technology, holding two patents that showcase his innovative approach to this area.
Latest Patents
Matsuo's latest patents include a plasma etching system and a plasma etching method. The plasma etching system comprises a process chamber that encloses a plasma, means for evacuating the process chamber, a chuck electrode for supporting a substrate, and a shower electrode positioned to face the chuck electrode. This shower electrode is equipped with a large number of small holes. A power source applies a plasma voltage between the chuck electrode and the shower electrode. Additionally, gas supply means communicate with the small holes of the shower electrode to supply a plasma-forming gas into the process chamber. The system is designed to control the gas supply such that the plasma-forming gas flows through the small holes at a mass flow rate of at least 620 kg/m²/hr.
Career Highlights
Throughout his career, Matsuo has worked with prominent companies such as Hitachi, Ltd. and Hitachi Tokyo Electronics Co., Ltd. His experience in these organizations has allowed him to refine his skills and contribute to advancements in technology.
Collaborations
Matsuo has collaborated with notable coworkers, including Kazushi Tomita and Yoshikazu Ito. These partnerships have likely enhanced his work and led to further innovations in the field.
Conclusion
Hiromitsu Matsuo is a distinguished inventor whose work in plasma etching technology has made a significant impact. His patents reflect his dedication to advancing this field, and his collaborations with esteemed colleagues further highlight his contributions.