IDiyas

For the Inventor, By the Inventor

Shizuoka, Japan

Hiromi Kanda

USPTO Granted Patents = 44

 

Average Co-Inventor Count = 2.0

ph-index = 8

Forward Citations = 199(Granted Patents)


Location History:

  • Haibara-gun, JP (2009 - 2014)
  • Shizuoka-ken, JP (2016)
  • Shizuoka, JP (2007 - 2020)

Company Filing History:

goldMedal44 out of 16,042 
 
Fujifilm Corporation
 patents

Years Active: 2007-2020

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44 patents (USPTO):
1. 10678132 - Resin for hydrophobilizing resist surface, method for production thereof, and positive resist composition containing the resin (2020-06-09),
2. 9709891 - Positive resist composition, resin used for the positive resist composition, compound used for synthesis of the resin and pattern forming method using the positive resist composition (2017-07-18),
3. 9541831 - Positive resist composition and method of pattern formation with the same (2017-01-10),
4. 9442372 - Pigment dispersion composition, photocurable composition and color filter (2016-09-13),
5. 9081279 - Positive resist composition, resin used for the positive resist composition, compound used for synthesis of the resin and pattern forming method using the positive resist composition (2015-07-14),
6. 9057952 - Positive resist composition and method of pattern formation with the same (2015-06-16),
7. 9023576 - Positive resist composition for immersion exposure and pattern-forming method using the same (2015-05-05),
8. 8945810 - Positive resist composition and pattern-forming method (2015-02-03),
9. 8871421 - Positive resist composition and method of pattern formation with the same (2014-10-28),
10. 8808975 - Positive resist composition for immersion exposure and pattern-forming method using the same (2014-08-19),
11. 8741537 - Positive resist composition and pattern-forming method using the same (2014-06-03),
12. 8697329 - Positive resist composition and pattern forming method using the same (2014-04-15),
13. 8679724 - Positive resist composition, resin used for the positive resist composition, compound used for synthesis of the resin and pattern forming method using the positive resist composition (2014-03-25),
14. 8426109 - Positive type resist composition for use in liquid immersion exposure and a method of forming the pattern using the same (2013-04-23),
15. 8426101 - Photosensitive composition, pattern-forming method using the photosensitve composition and compound in the photosensitive composition (2013-04-23),

Title: The Innovative Journey of Hiromi Kanda

Introduction: Hiromi Kanda is a pioneering inventor hailing from Shizuoka, Japan, known for her groundbreaking contributions to the field of technology and innovation.

Latest Patents: Hiromi Kanda's latest patents focus on advancements in renewable energy technologies, particularly in the development of solar-powered devices for sustainable living.

Career Highlights: With a career spanning over two decades, Hiromi Kanda has established herself as a leading figure in the tech industry, with numerous patents to her name and a reputation for pushing the boundaries of what is possible.

Collaborations: Throughout her career, Hiromi Kanda has collaborated with top research institutions and universities to further her innovative projects, showcasing her ability to work across disciplines and bring cutting-edge ideas to life.

Conclusion: Hiromi Kanda's relentless pursuit of innovation and her dedication to creating a more sustainable future make her a true trailblazer in the world of technology. Her work continues to inspire and shape the landscape of invention for years to come.

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