The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 09, 2020
Filed:
Mar. 14, 2008
Applicant:
Hiromi Kanda, Shizuoka, JP;
Inventor:
Hiromi Kanda, Shizuoka, JP;
Assignee:
FUJIFILM Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01); G03F 7/30 (2006.01); C08F 210/00 (2006.01); C08F 220/24 (2006.01); C08F 220/40 (2006.01); C08F 214/18 (2006.01); G03F 7/039 (2006.01); G03F 7/075 (2006.01); G03F 7/11 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0046 (2013.01); C08F 210/00 (2013.01); C08F 214/18 (2013.01); C08F 220/24 (2013.01); C08F 220/40 (2013.01); G03F 7/0397 (2013.01); G03F 7/0758 (2013.01); G03F 7/11 (2013.01); G03F 7/2041 (2013.01); G03F 7/30 (2013.01);
Abstract
A resin is to be added to a resist composition and localized on a surface of a resist film so as to hydrophobilize the surface of a resist film and has a peak area of a high molecular weight component having a molecular weight of 30,000 or more is 0.1% or less of a total peak area in a molecular weight distribution measured by gel permeation chromatography.