The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 18, 2017
Filed:
Feb. 27, 2015
Applicant:
Fujifilm Corporation, Minato-ku, Tokyo, JP;
Inventors:
Hiromi Kanda, Shizuoka, JP;
Shinichi Kanna, Shizuoka, JP;
Assignee:
FUJIFILM Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/039 (2006.01); G03F 7/004 (2006.01); G03F 7/075 (2006.01); G03F 7/20 (2006.01); G03F 7/30 (2006.01); G03F 7/32 (2006.01); C07C 69/653 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0397 (2013.01); C07C 69/653 (2013.01); G03F 7/0045 (2013.01); G03F 7/0046 (2013.01); G03F 7/039 (2013.01); G03F 7/0392 (2013.01); G03F 7/0395 (2013.01); G03F 7/0757 (2013.01); G03F 7/0758 (2013.01); G03F 7/2041 (2013.01); G03F 7/30 (2013.01); G03F 7/322 (2013.01);
Abstract
A positive resist composition comprises: (A) a resin of which solubility in an alkali developer increases under an action of an acid; (B) a compound capable of generating an acid upon irradiation with actinic rays or radiation; (C) a resin having at least one of a fluorine atom and a silicon atom; and (D) a solvent; and a pattern forming method using the positive resist composition.