Kyoto, Japan

Hiroki Taniguchi


Average Co-Inventor Count = 4.2

ph-index = 2

Forward Citations = 22(Granted Patents)


Company Filing History:


Years Active: 2005-2021

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8 patents (USPTO):Explore Patents

Title: Hiroki Taniguchi: Innovator in Substrate Processing Technology

Introduction

Hiroki Taniguchi, an accomplished inventor based in Kyoto, Japan, has made significant contributions to the field of substrate processing technology. With a total of eight patents to his name, his work has been pivotal in advancing semiconductor manufacturing processes.

Latest Patents

Taniguchi's recent patents include the "Substrate Processing Device," "Substrate Processing Method," and "Substrate Processing System." The substrate processing device features a substrate holding table, an ultraviolet irradiator, a tubular member, and two gas supplying units. This setup allows for effective ultraviolet irradiation of the substrate through an active space, enhancing the efficiency of substrate processing. Moreover, his patent for a "Semiconductor Integrated Circuit Device Having a Dummy Metal Wiring Line" presents a layout structure that prevents thinning and breakage of metal wiring lines near cell boundaries, thereby optimizing circuit functionality without complicating the manufacturing process.

Career Highlights

Throughout his career, Taniguchi has worked with renowned organizations, including Panasonic Corporation and Matsushita Electric Industrial Co., Ltd. His experiences within these companies have greatly influenced his innovative approaches in the field of semiconductor technology.

Collaborations

Taniguchi has collaborated with various talented professionals, including Hidetoshi Nishimura and Ritsuko Ozoe. These collaborations have fostered a creative environment that encourages the development of groundbreaking technologies in substrate processing.

Conclusion

Hiroki Taniguchi stands out as a prominent figure in the field of substrate processing, with his patents reflecting a commitment to technological advancement. His dedication and innovative spirit continue to inspire the future of semiconductor manufacturing.

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