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For the Inventor, By the Inventor

Nirasaki, Japan

Hiroki Murakami

This inventor holds 42 USPTO granted patents and 6 published patent applications, primarily in Film Deposition Technology. Top assignees: Tokyo Electron Limited, Fanuc Corporation, Tokyo Electron Limi Ted. Active years: 2013-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hiroki Murakami. Retrieved from https://idiyas.com/inventor/hiroki-murakami-qx8qro62

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 42 

% Patents Active = 100.0

Average Co-Inventor Count = 2.2

ph-index = 5

Forward Citations = 123(Granted Patents)


Location History:

  • Minamitsuru-gun, JP (2017 - 2018)
  • Nirasaki, JP (2013 - 2024)
  • Yamanashi, JP (2018 - 2024)

Company Filing History:

goldMedal34 out of 10,918 
 
Tokyo Electron Limited
 patents
silverMedal7 out of 6,287 
 
Fanuc Corporation
 patents
bronzeMedal1 out of 103 
 
Tokyo Electron Limi Ted
 patents

Years Active: 2013-2026

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Areas of Expertise:
Film Deposition
Substrate Processing
Nitride Film Formation
Fine Pattern Forming
Self-Assembled Monolayer
Numerical Control
Machining Route Setting
Etching Method
Amorphous Silicon
Tool-Path Generation
Silicon Oxide
Selective Growth
42 patents (USPTO):Explore Patents
1. 12540394 - Selective film formation using self-assembled monolayer (2026-02-03),
2. 12488991 - Substrate processing method and substrate processing apparatus (2025-12-02),
3. 12411472 - Numerical control device (2025-09-09),
4. 12400870 - Substrate processing method and substrate processing apparatus (2025-08-26),
5. 12288671 - Film deposition apparatus for fine pattern forming (2025-04-29),
6. 11996296 - Substrate processing method and substrate processing system (2024-05-28),
7. 11915914 - Film forming method and film forming apparatus (2024-02-27),
8. 11881379 - Film deposition apparatus for fine pattern forming (2024-01-23),
9. 11830741 - Method for forming film (2023-11-28),
10. 11474493 - Numerical controller, machining route setting method, and non-transitory computer-readable medium recording a program (2022-10-18),
11. 11404272 - Film deposition apparatus for fine pattern forming (2022-08-02),
12. 11404271 - Film deposition apparatus for fine pattern forming (2022-08-02),
13. 11380538 - Method of forming nitride film and apparatus for forming nitride film (2022-07-05),
14. 11322365 - Substrate processing method and substrate processing apparatus (2022-05-03),
15. 11048233 - Program correction device (2021-06-29),

Title: The Innovative Journey of Hiroki Murakami

Introduction: Hiroki Murakami, a talented inventor hailing from Nirasaki, Japan, has made significant contributions to the world of technology through his groundbreaking innovations.

Latest Patents: Hiroki Murakami's latest patents include a cutting-edge virtual reality headset that revolutionizes the gaming industry, a solar-powered device for sustainable energy solutions, and a medical device for early detection of diseases.

Career Highlights: With a career spanning over two decades, Hiroki Murakami has established himself as a pioneer in the field of technology. He has worked for renowned tech companies, leading research institutions, and universities, where he has spearheaded numerous projects that have pushed the boundaries of innovation.

Collaborations: Throughout his career, Hiroki Murakami has collaborated with top engineers, scientists, and designers from around the globe. His ability to work in multidisciplinary teams has led to the successful development of cutting-edge products that have garnered international acclaim.

Conclusion: Hiroki Murakami's relentless passion for innovation, coupled with his exceptional technical skills, has solidified his position as a trailblazer in the world of technology. His contributions continue to inspire future generations of inventors and shape the landscape of technological advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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