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Hiroki Endo

USPTO Granted Patents = 16 (Patent Applications = 4)

Average Co-Inventor Count = 2.9

ph-index = 3

Forward Citations = 89(Granted Patents)

Location History:

Nirasaki, JP (2008)
Yamanashi, JP (2009 - 2012)
Miyagi, JP (2019 - 2024)

Company Filing History:

16 out of 10,341

Tokyo Electron Limited

where one patent can have more than one assignee

Years Active: 2008-2025

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16 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 12463021 - Substrate processing apparatus and maintenance method for substrate processing apparatus (2025-11-04),

2. 12424416 - Substrate processing apparatus and parameter acquisition method (2025-09-23),

3. 12402208 - Substrate processing system and substrate processing method (2025-08-26),

4. 12387917 - Plasma processing apparatus and plasma processing method (2025-08-12),

5. 12106948 - Plasma processing apparatus and monitoring device (2024-10-01),

6. 11923211 - Correction data creating method, substrate processing method, and substrate processing system (2024-03-05),

7. 11917729 - Substrate processing system and substrate processing method (2024-02-27),

8. 11694881 - Stage and plasma processing apparatus (2023-07-04),

9. 11581168 - Plasma processing apparatus and method (2023-02-14),

10. 11239062 - Plasma processing apparatus with heater and power frequency control (2022-02-01),

11. 10896832 - Substrate processing method and substrate processing apparatus (2021-01-19),

12. 10886109 - Stage and plasma processing apparatus (2021-01-05),

13. 10264662 - Plasma processing apparatus (2019-04-16),

14. 8109288 - Flow rate control system and shower plate used for partial pressure control system (2012-02-07),

15. 7481240 - Partial pressure control system, flow rate control system and shower plate used for partial pressure control system (2009-01-27),

Title: Hiroki Endo: Innovator in Substrate Processing Technology

Introduction

Hiroki Endo is a prominent inventor based in Miyagi, Japan. He has made significant contributions to the field of substrate processing, holding a total of 15 patents. His innovative work focuses on enhancing the efficiency and effectiveness of substrate processing systems.

Latest Patents

Hiroki Endo's latest patents include a substrate processing apparatus and a parameter acquisition method. The substrate processing apparatus features a heater resistor and a digital filter that processes detection voltage and current. This system allows for precise temperature control of the heater resistor. Another notable patent is the substrate processing system, which includes a stage for substrate placement, a heater, and a sensor for measuring resistance values. The controller in this system utilizes a conversion table to manage temperature adjustments effectively.

Career Highlights

Throughout his career, Hiroki Endo has worked with notable companies such as Tokyo Electron Limited and CKD Corporation. His experience in these organizations has contributed to his expertise in substrate processing technologies.

Collaborations

Hiroki Endo has collaborated with several professionals in his field, including Kazuhito Yamada and Hideki Nagaoka. These collaborations have further enriched his work and innovations.

Conclusion

Hiroki Endo's contributions to substrate processing technology demonstrate his commitment to innovation and excellence. His patents reflect a deep understanding of the complexities involved in substrate processing systems.

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