The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 19, 2021
Filed:
May. 29, 2019
Tokyo Electron Limited, Tokyo, JP;
Kazuhito Yamada, Miyagi, JP;
Hiroki Endo, Miyagi, JP;
TOKYO ELECTRON LIMITED, Tokyo, JP;
Abstract
In substrate processing method, a change in a voltage, which is applied to a component provided in a substrate processing apparatus configured to process a substrate, is measured and a current flowing through the component is measured. A temperature of the component is obtained from a change in a resistance calculated based on the voltage and the current with reference to a conversion table in which a plurality of resistances is correlated with a plurality of temperatures. A determination of whether or not abnormality has occurred in a temperature of the substrate is made based on the change in the voltage, and processing of the substrate is stopped when it is determined that the abnormality has occurred.