Nirasaki, Japan

Hirokazu Higashijima

USPTO Granted Patents = 3 

Average Co-Inventor Count = 4.6

ph-index = 2

Forward Citations = 11(Granted Patents)


Location History:

  • Yamanashi, JP (2014)
  • Nirasaki, JP (2012 - 2016)

Company Filing History:


Years Active: 2012-2016

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3 patents (USPTO):Explore Patents

Title: Innovations by Hirokazu Higashijima in Semiconductor Technology

Introduction

Hirokazu Higashijima, an accomplished inventor from Nirasaki, Japan, has made significant contributions to the field of semiconductor technology. With a total of three patents to his name, he has established himself as a key figure in innovation at Tokyo Electron Limited. His work primarily revolves around methods that enhance semiconductor device manufacturing.

Latest Patents

Higashijima's latest patents reflect his deep understanding of semiconductor processes. One notable patent is a semiconductor device manufacturing method that involves forming a gate insulating film made from hafnium oxide and zirconium oxide on a workpiece equipped with a source, a drain, and a channel. The innovative aspect of this method includes a crystallization heat treatment of the gate insulating film at a temperature of 600 degrees Celsius or less, achieving a remarkable relative permittivity of 27 or more.

Another significant patent is the fabrication method of a semiconductor device. This process entails depositing a dielectric film on a semiconductor substrate, thermally treating the dielectric film, and subsequently irradiating an ionized gas cluster onto the thermally treated dielectric film. These advancements hold enormous potential for improving semiconductor efficiency and performance.

Career Highlights

Hirokazu Higashijima has built a prominent career at Tokyo Electron Limited, where his expertise in semiconductor devices has driven innovation and technological advancement. His work has been instrumental in developing more reliable and efficient manufacturing processes within the semiconductor industry.

Collaborations

Throughout his career, Higashijima has worked alongside talented colleagues, including Koji Akiyama and Chihiro Tamura. These collaborations have fostered an environment of creativity and innovation, allowing for the cross-pollination of ideas and the development of groundbreaking technologies in semiconductor manufacturing.

Conclusion

Hirokazu Higashijima's contributions to semiconductor technology are an embodiment of innovation in the field. With three patents and ongoing advancements at Tokyo Electron Limited, his work continues to impact the semiconductor industry positively. As technology evolves, Higashijima's inventions will undoubtedly play a crucial role in shaping the future of semiconductor manufacturing.

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