Tagawa, Japan

Hirofumi Shiokawa

This inventor holds 3 USPTO granted patents and 5 published patent applications and 3 EPO patents. Top assignee: Resonac Corporation. Active years: 2025-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hirofumi Shiokawa. Retrieved from https://idiyas.com/inventor/hirofumi-shiokawa

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 3 

% Patents Active = 100.0

 

Average Co-Inventor Count = 6.9

ph-index = 1


Company Filing History:


Years Active: 2025-2026

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3 patents (USPTO):Explore Patents

Title: Hirofumi Shiokawa: Innovator in Silver Mirror Film Technology.

Introduction

Hirofumi Shiokawa is a notable inventor based in Tagawa, Japan. He has made significant contributions to the field of materials science, particularly in the development of innovative film-forming liquids.

Latest Patents

Shiokawa holds a patent for an "Ornament and silver mirror film-forming liquid." This invention includes a base material and a silver particle layer containing silver particles. The silver particle layer is designed to have a surface resistivity of 10Ω/□ or more, with the silver particles stacked in the thickness direction of the layer. This technology has potential applications in various decorative and functional products.

Career Highlights

Hirofumi Shiokawa is currently employed at Resonac Corporation, where he continues to advance his research and development efforts. His work focuses on enhancing the properties and applications of silver-based materials.

Collaborations

Shiokawa collaborates with talented colleagues, including Masumi Morihara and Masahiro Iwanaga. Their combined expertise contributes to the innovative projects at Resonac Corporation.

Conclusion

Hirofumi Shiokawa's contributions to the field of silver mirror film technology highlight his role as a leading inventor in Japan. His innovative patent reflects the potential for advancements in material applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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