Introduction: Hiroaki Chihaya is a prominent inventor based in Nirasaki, Japan. He has made significant contributions to the field of substrate processing and film formation technologies. With a total of seven patents to his name, Chihaya's work has had a considerable impact on the industry.

Latest Patents: One of his latest patents is a method and device for substrate processing. This invention involves a substrate processing device that includes a rotatable stage, a frozen heat transfer body, a gas supply mechanism, a rotation mechanism, and a processing mechanism. The method allows for the continuous processing of multiple substrates while maintaining a steady cooling temperature. Another notable patent is a film forming apparatus, which utilizes magnetron sputtering to form films. This apparatus includes a substrate support, a target holder, a magnet unit, and a controller that synchronizes the movements of the substrate support and the magnet unit during film formation.

Career Highlights: Hiroaki Chihaya has worked with Tokyo Electron Limited, a leading company in the semiconductor industry. His experience at this company has allowed him to develop innovative technologies that enhance substrate processing and film formation.

Collaborations: Throughout his career, Chihaya has collaborated with notable individuals such as Einstein Noel Abarra and Masato Shinada. These collaborations have contributed to the advancement of his inventions and the overall progress in his field.

Profile summary based on public USPTO records.

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