Tilburg, Netherlands

Hindrik Willem DeVries


Average Co-Inventor Count = 4.8

ph-index = 2

Forward Citations = 28(Granted Patents)


Company Filing History:


Years Active: 2008-2009

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2 patents (USPTO):Explore Patents

Title: Hindrik Willem DeVries: Innovator in Plasma Technology

Introduction

Hindrik Willem DeVries is a notable inventor based in Tilburg, Netherlands. He has made significant contributions to the field of plasma technology, holding two patents that showcase his innovative approach to generating and controlling plasma.

Latest Patents

DeVries's latest patents include an "Arrangement, method and electrode for generating a plasma." This invention provides a method for generating a uniform and stable plasma using a discharge space between electrodes. The design incorporates a boundary surface made of alternately arranged conductive and insulating regions, which can be utilized in various applications, including dielectric barrier discharge configurations and atmospheric pressure glow plasmas for material processing.

Another significant patent is the "Method and arrangement for controlling a glow discharge plasma under atmospheric conditions." This invention focuses on controlling a glow discharge plasma in a gas or gas mixture by generating plasma pulses through an AC plasma energizing voltage. The method allows for precise control of the plasma by managing the displacement current after the pulse maximum.

Career Highlights

Hindrik Willem DeVries is associated with Fuji Photo Film B.V., where he applies his expertise in plasma technology. His work has contributed to advancements in various applications, enhancing the capabilities of plasma generation and control.

Collaborations

DeVries has collaborated with notable colleagues, including Jan Bastiaan Bouwstra and Mauritius Cornelius Maria Van De Sanden. These partnerships have fostered innovation and development in the field of plasma technology.

Conclusion

Hindrik Willem DeVries stands out as an influential inventor in plasma technology, with patents that reflect his innovative spirit and dedication to advancing the field. His contributions continue to impact various applications, showcasing the importance of his work in modern technology.

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