The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 19, 2009
Filed:
Aug. 13, 2004
Hindrik Willem Devries, Tilburg, NL;
Jan Bastiaan Bouwstra, Bilthoven, NL;
Eugen Aldea, Eindhoven, NL;
Mauritius Cornelius Maria Van DE Sanden, Tilburg, NL;
Hindrik Willem DeVries, Tilburg, NL;
Jan Bastiaan Bouwstra, Bilthoven, NL;
Eugen Aldea, Eindhoven, NL;
Mauritius Cornelius Maria Van De Sanden, Tilburg, NL;
Fuji Photo Film B.V., Tilburg, NL;
Abstract
The present invention provides an arrangement and method for generating a uniform and stable plasma. The arrangement comprises a discharge space () between at least a pair of electrodes (), which electrodes () are arranged for providing an electric field and for generating a plasma in the electric field. At least one of the electrodes () has a boundary surface () with the discharge space (). The boundary surface is comprised of one or more alternately arranged conductive () and insulating regions (). The invention further relates to an electrode () for use in the arrangement described. The invention may, for example, be used in dielectric barrier discharge configurations, or in arrangements for generating plasmas at atmospheric pressures, or for generating plasmas at low temperatures, such as generating atmospheric pressure glow plasmas (APG) for material processing or surface () treatment purposes.