The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 15, 2008
Filed:
Aug. 12, 2005
Hindrik Willem Devries, Tilburg, NL;
Yoichiro Kamiyama, Tilburg, NL;
Jan Bastiaan Bouwstra, Bilthoven, NL;
Mauritius Cornelius Maria Van DE Sanden, Tilburg, NL;
Eugen Aldea, Eindhoven, NL;
Paul Peeters, Eindhoven, NL;
Hindrik Willem DeVries, Tilburg, NL;
Yoichiro Kamiyama, Tilburg, NL;
Jan Bastiaan Bouwstra, Bilthoven, NL;
Mauritius Cornelius Maria Van de Sanden, Tilburg, NL;
Eugen Aldea, Eindhoven, NL;
Paul Peeters, Eindhoven, NL;
Fuji Photo Film B.V., , NL;
Abstract
The present invention is directed to a method and arrangement for controlling a glow discharge plasma in a gas or gas mixture under atmospheric conditions, in a plasma discharge space comprising at least two spaced electrodes in which at least one plasma pulse having an absolute pulse maximum is generated by applying an AC plasma energizing voltage to the electrodes causing a plasma current and a displacement current. The plasma is controlled by providing a relative decrease of the displacement current after the pulse maximum. In a preferred embodiment, the energizing voltage is applied through a series circuit including a choke coil and a non-saturable inductor.