Fuji Photo Film B.v.

Hindrik Willem DeVries

Jan Bastiaan Bouwstra

Eugen Aldea

Mauritius Cornelius Maria Van De Sanden

Paul Peeters

Yoichiro Kamiyama

The present invention provides an arrangement and method for generating a uniform and stable plasma. The arrangement comprises a discharge space () between at least a pair of electrodes (), which electrodes () are arranged for providing an electric field and for generating a plasma in the electric field. At least one of the electrodes () has a boundary surface () with the discharge space (). The boundary surface is comprised of one or more alternately arranged conductive () and insulating regions (). The invention further relates to an electrode () for use in the arrangement described. The invention may, for example, be used in dielectric barrier discharge configurations, or in arrangements for generating plasmas at atmospheric pressures, or for generating plasmas at low temperatures, such as generating atmospheric pressure glow plasmas (APG) for material processing or surface () treatment purposes.

Arrangement, method and electrode for generating a plasma

The present invention is directed to a method and arrangement for controlling a glow discharge plasma in a gas or gas mixture under atmospheric conditions, in a plasma discharge space comprising at least two spaced electrodes in which at least one plasma pulse having an absolute pulse maximum is generated by applying an AC plasma energizing voltage to the electrodes causing a plasma current and a displacement current. The plasma is controlled by providing a relative decrease of the displacement current after the pulse maximum. In a preferred embodiment, the energizing voltage is applied through a series circuit including a choke coil and a non-saturable inductor.

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Tilburg, Netherlands

Hindrik Willem DeVries