Location History:
- Nirasaki, JP (2012 - 2013)
- Miyagi, JP (2018)
Company Filing History:
Years Active: 2012-2025
Title: Hikoichiro Sasaki: Innovator in Plasma Processing Technology
Introduction
Hikoichiro Sasaki is a prominent inventor based in Nirasaki, Japan. He has made significant contributions to the field of plasma processing, holding a total of 5 patents. His work has been instrumental in advancing technologies that utilize plasma for various applications.
Latest Patents
Sasaki's latest patents include a plasma processing method and a plasma processing apparatus. The plasma processing method involves an etching technique that includes several steps. First, a substrate containing a silicon oxide film is prepared and placed on a substrate support within a chamber. Next, a processing gas, which consists of tungsten hexafluoride, a gas containing carbon and fluorine, and an oxygen-containing gas, is supplied into the chamber. Finally, plasma is generated from the processing gas to etch the silicon-containing film, with the process including the periodic application of a negative DC voltage to the substrate support.
Career Highlights
Hikoichiro Sasaki is currently employed at Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His innovative work in plasma processing has positioned him as a key figure in the development of advanced manufacturing techniques.
Collaborations
Sasaki has collaborated with notable colleagues, including Kosei Ueda and Taichi Hirano. Their combined expertise has contributed to the success of various projects within the company.
Conclusion
Hikoichiro Sasaki's contributions to plasma processing technology highlight his role as an influential inventor in the field. His patents and collaborative efforts continue to shape advancements in semiconductor manufacturing.